- 专利标题: Method for manufacturing high efficiency light-emitting diodes
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申请号: US11030790申请日: 2005-01-07
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公开(公告)号: US20060094138A1公开(公告)日: 2006-05-04
- 发明人: Wei-Chih Lai , Jinn-Kong Sheu , Chi-Ming Tsai , Cheng-Ta Kuo
- 申请人: Wei-Chih Lai , Jinn-Kong Sheu , Chi-Ming Tsai , Cheng-Ta Kuo
- 专利权人: South Epitaxy Corporation
- 当前专利权人: South Epitaxy Corporation
- 优先权: TW93133086 20041029
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
A method for manufacturing a high efficiency light-emitting diode (LED) is disclosed. In the method, a substrate is provided, in which an N-type buffer layer, an N-type cladding layer and an active layer are stacked on the substrate in sequence. A first P-type cladding layer is formed on the active layer. Next, a growth-interruption step is performed, and a catalyst is introduced to form a plurality of nuclei sites on a surface of the first P-type cladding layer. A second P-type cladding layer is formed on the first P-type cladding layer according to the nuclei sites, so that the second P-type cladding layer has a surface with a plurality of mesa hillocks. Then, a contact layer is formed on the second P-type cladding layer. Subsequently, a transparent electrode is formed on the contact layer.
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