发明申请
- 专利标题: Dense seed layer and method of formation
- 专利标题(中): 密实种子层和形成方法
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申请号: US10980561申请日: 2004-11-03
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公开(公告)号: US20060094239A1公开(公告)日: 2006-05-04
- 发明人: Stefan Wurm
- 申请人: Stefan Wurm
- 主分类号: H01L21/44
- IPC分类号: H01L21/44
摘要:
Methods of forming dense seed layers and structures thereof. Seed layers comprising a monolayer of molecules having a density of about 0.5 or greater may be manufactured over a metal layer, resulting in a well defined interface region between the metal layer and a subsequently formed material layer. A seed layer comprising a monolayer of atoms is formed over the metal layer, the temperature of the workpiece is lowered, and a physisorbed layer is formed over the seed layer, the physisorbed layer comprising a weakly bound layer of first molecules. A portion of the first molecules in the physisorbed layer are dissociated by irradiating the physisorbed layer with energy, the dissociated atoms of the first molecules being proximate the seed layer. The workpiece is then heated, causing integration of the dissociated atoms of the first molecules of the physisorbed layer into the seed layer and removing the physisorbed layer.
公开/授权文献
- US07294851B2 Dense seed layer and method of formation 公开/授权日:2007-11-13
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