发明申请
- 专利标题： Method of oxidizing member to be treated
- 专利标题（中）： 氧化待处理物质的方法
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申请号： US10519451申请日： 2003-07-07
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公开(公告)号： US20060094248A1公开(公告)日： 2006-05-04
- 发明人: Tatsuo Nishita , Tsukasa Yonekawa , Keisuke Suzuki , Toru Sato
- 申请人： Tatsuo Nishita , Tsukasa Yonekawa , Keisuke Suzuki , Toru Sato
- 优先权： JP2002-197671 20020705
- 国际申请： PCT/JP03/08609 WO 20030707
- 主分类号： H01L21/31
- IPC分类号： H01L21/31
摘要：
A method for oxidation of an object to be processed is provided wherein an oxide film can provide favorable film quality and a laminate structure of nitride film and oxide film can be obtained by a thermal oxidation of a nitride film. In a method for oxidation of a surface of an object to be processed in a single processing container 8 which can contain a plurality of objects to be processed, at least a nitride film is exposed on said surface, and said oxidation is performed by mainly using active hydroxyl/oxygen species in a vacuum atmosphere, setting a processing pressure to 133 Pa or below, and setting a processing temperature to 400° C. or above. Under these conditions, high interplanar uniformity is maintained and oxide films with favorable film quality are obtained by oxidizing nitride films on the surfaces of a plurality of objects to be processed.
公开/授权文献
- US07304002B2 Method of oxidizing member to be treated 公开/授权日：2007-12-04
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