发明申请
- 专利标题: Electron beam irradiation apparatus, electron beam irradiation method, and apparatus for and method of manufacturing disc-shaped object
- 专利标题(中): 电子束照射装置,电子束照射方法及其制造方法及其制造方法
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申请号: US10528518申请日: 2003-09-18
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公开(公告)号: US20060098550A1公开(公告)日: 2006-05-11
- 发明人: Mamoru Usami , Kazushi Tanaka , Kenji Yoneyama , Yukio Kaneko , Takeshi Umega
- 申请人: Mamoru Usami , Kazushi Tanaka , Kenji Yoneyama , Yukio Kaneko , Takeshi Umega
- 优先权: JP2002-274120 20020919; JP2002-274121 20020919
- 国际申请: PCT/JP03/11890 WO 20030918
- 主分类号: G11B7/00
- IPC分类号: G11B7/00
摘要:
An electron beam irradiation apparatus and method capable of easily curing at least part of a surface layer and/or a resin layer composed of materials that are hard to be cured by irradiation of ultraviolet rays. A disc-shaped object manufacturing apparatus and method capable of efficiently forming, on the disc-shaped object, at least part of a surface layer and/or a resin layer such as light transmitting layer, etc, thereunder. An electron beam irradiation apparatus comprises a rotary driving unit for rotationally driving an object, a shield container rotatably accommodating the object, and an electron beam irradiation unit provided in the shield container so that the surface of the object is irradiated with electron beams from an irradiation window thereof, wherein the surface of the object is irritated with the electron beams during its rotation from the irradiation window of the election beam irradiation unit. The surface of the on-rotating object can be thereby irradiated with the electron beams having larger energy than the ultraviolet rays have.
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