发明申请
- 专利标题: METHOD FOR RAPID PROTOTYPING BY USING PLANE LIGHT AS SOURCES
- 专利标题(中): 使用平面光源作为源的快速原型化方法
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申请号: US10974719申请日: 2004-10-28
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公开(公告)号: US20060100733A1公开(公告)日: 2006-05-11
- 发明人: Sheng-Jye Huang , Cheng-Chien Wang , Sen-Yung Lee , Chuih-Kuan Wang , Chun-Shan Wang , Chuh-Yung Chen , Chieh-Li Chen , Wei-Siang Lai , Chen Hsieh , Tzong-Shing Leu , Chun-I Cheng
- 申请人: Sheng-Jye Huang , Cheng-Chien Wang , Sen-Yung Lee , Chuih-Kuan Wang , Chun-Shan Wang , Chuh-Yung Chen , Chieh-Li Chen , Wei-Siang Lai , Chen Hsieh , Tzong-Shing Leu , Chun-I Cheng
- 主分类号: G06F19/00
- IPC分类号: G06F19/00
摘要:
A method for rapid prototyping by using plane light as sources treats the raw material by two stages. The first stage includes a step of spreading raw material onto a defined zone by nozzles and rolling the material to have a flat surface and a step of illuminating the raw materials by plane light and electronic beams to cause a first time of physical or chemical changes. The second stage includes a step of using more powerful plane light source with cooperation with portable Digital Micromirror Device (DMD) or Liquid Crystal Display (LCD) to scan the selected zones of the material to cause a second time of physical or chemical changes, and a step of stacking the 2-D images sodas to obtain a solid work piece.
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