发明申请
US20060102829A1 Method for producing a TFA image sensor and one such TFA image sensor
有权
用于生产TFA图像传感器和一个这样的TFA图像传感器的方法
- 专利标题: Method for producing a TFA image sensor and one such TFA image sensor
- 专利标题(中): 用于生产TFA图像传感器和一个这样的TFA图像传感器的方法
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申请号: US11271492申请日: 2005-11-11
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公开(公告)号: US20060102829A1公开(公告)日: 2006-05-18
- 发明人: Peter Rieve , Konstantin Seibel , Jens Prima , Markus Scholz , Tarek Lule , Stephen Benthien , Michael Sommer , Michael Wagner
- 申请人: Peter Rieve , Konstantin Seibel , Jens Prima , Markus Scholz , Tarek Lule , Stephen Benthien , Michael Sommer , Michael Wagner
- 申请人地址: NL Schiphol Airport Amsterdam
- 专利权人: STMicroelectronics NV
- 当前专利权人: STMicroelectronics NV
- 当前专利权人地址: NL Schiphol Airport Amsterdam
- 优先权: DE101523254.4 20011026
- 主分类号: H01L27/00
- IPC分类号: H01L27/00 ; H01L31/00
摘要:
The invention relates to a method for producing a TFA image sensor in which a multi-layer arrangement comprising a photo diode matrix is arranged on an ASIC switching circuit provided with electronic circuits for operating the TFA image sensor, such as pixel electronics, peripheral electronics and system electronics, for the pixel-wise conversion of electromagnetic radiation into an intensity-dependent photocurrent, the pixels being connected to contacts of the underlying pixel electronics of the ASIC switching circuit. The method enables conventionally produced ASIC switching circuits to be used without impairing the topography of the photoactive sensor surface. The CMOS passivation layer in the photoactive region and then the upper CMOS metallization are removed and replaced by a metallic layer which is structured in the pixel raster, for the formation of back electrodes. The photo diode matrix is then applied and structured, said photo diode matrix being embodied as a pixel matrix, on which a passivating protective layer and/or a color filter layer having a passivating action can be applied.
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