- 专利标题： METHOD AND APPARATUS FOR CLEANING A SEMICONDUCTOR SUBSTRATE IN AN IMMERSION LITHOGRAPHY SYSTEM
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申请号： US10904601申请日： 2004-11-18
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公开(公告)号： US20060103818A1公开(公告)日： 2006-05-18
- 发明人: Steven Holmes , Mark Hakey , Toshiharu Furukawa , David Horak
- 申请人： Steven Holmes , Mark Hakey , Toshiharu Furukawa , David Horak
- 申请人地址： US NY Armonk
- 专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址： US NY Armonk
- 主分类号： G03B27/42
- IPC分类号： G03B27/42 ; G03F7/20
摘要：
A method and apparatus for reduction and prevention of residue formation and removal of residues formed in an immersion lithography tool. The apparatus including incorporation of a cleaning mechanism within the immersion head of an immersion lithographic system or including a cleaning mechanism in a cleaning station of an immersion lithographic system.
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