发明申请
US20060105574A1 Process for defining integrated circuits in semiconductor electronic devices
审中-公开
用于定义半导体电子器件中的集成电路的工艺
- 专利标题： Process for defining integrated circuits in semiconductor electronic devices
- 专利标题（中）： 用于定义半导体电子器件中的集成电路的工艺
-
申请号： US11280186申请日： 2005-11-16
-
公开(公告)号： US20060105574A1公开(公告)日： 2006-05-18
- 发明人: Samantha Regini , Simone Alba
- 申请人： Samantha Regini , Simone Alba
- 申请人地址： IT Agrate Brianza
- 专利权人： STMicroelectronics S.r.I.
- 当前专利权人： STMicroelectronics S.r.I.
- 当前专利权人地址： IT Agrate Brianza
- 优先权： ITMI2004A002206 20041117
- 主分类号： H01L21/461
- IPC分类号： H01L21/461 ; C23F1/00 ; H01L21/302
摘要：
A process for the definition of integrated circuits on a wafer having at least one silicon semiconductor layer includes masking the wafer with a photoresist layer. The process includes a development step of the photoresist with definition of a lithographic pattern, a hardening step of the photoresist with a plasma of inert gas, and a dry etching step with a plasma of reactive gas for transferring the lithographic pattern on the wafer. The dry etching step includes at least an initial step, or breakthrough, with a plasma of a chlorinated gas and of an inert gas for removal of a silicon native oxide grown on the wafer.