Invention Application
- Patent Title: Scanning electron microscope and system for inspecting semiconductor device
- Patent Title (中): 扫描电子显微镜和半导体器件检测系统
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Application No.: US11268568Application Date: 2005-11-08
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Publication No.: US20060108525A1Publication Date: 2006-05-25
- Inventor: Ryo Nakagaki , Toshifumi Honda
- Applicant: Ryo Nakagaki , Toshifumi Honda
- Priority: JP2004-326924 20041110
- Main IPC: G21K7/00
- IPC: G21K7/00

Abstract:
A scanning electron microscope has an electron source for illuminating a primary electron beam on a specimen wafer, an accelerating electrode, a condenser lens, a deflector, an objective lens, a detector for acquiring a digital image by sampling a signal of emissive electrons generated from the specimen wafer, a digitizing means, an image memory for storing, displaying or processing the acquired digital image, an input/output unit, an image creation unit and an image processor. The scanning electron microscope is provided with a sampling unit for sampling the emissive electron signal at intervals each smaller than the pixel size of the digital image to be stored, displayed or processed and an image creation process means for enlarging the pixel size on the basis of the sampled emissive electron signal to create a digital image.
Public/Granted literature
- US07834317B2 Scanning electron microscope and system for inspecting semiconductor device Public/Granted day:2010-11-16
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