发明申请
US20060111803A1 Method and system for estimating manufacturing target bias 有权
估算制造目标偏差的方法和系统

  • 专利标题: Method and system for estimating manufacturing target bias
  • 专利标题(中): 估算制造目标偏差的方法和系统
  • 申请号: US10994078
    申请日: 2004-11-19
  • 公开(公告)号: US20060111803A1
    公开(公告)日: 2006-05-25
  • 发明人: Yen-Pu HsuCheng WeiMei-Jen Wu
  • 申请人: Yen-Pu HsuCheng WeiMei-Jen Wu
  • 主分类号: G06F19/00
  • IPC分类号: G06F19/00
Method and system for estimating manufacturing target bias
摘要:
A computer implemented method for estimating manufacturing target bias for products in manufacturing tools. The method first establishes a first data set according to manufacturing target bias history based on a correlation with tools used. The manufacturing tools comprise a first manufacturing tool and other manufacturing tools. Next, a testing operation is executed for a predicted product in the first manufacturing tool to obtain a first predicted manufacturing target bias. Finally, manufacturing target bias of the predicted product in the other manufacturing tools is calculated according to the first data set and the first predicted manufacturing target bias.
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