发明申请
- 专利标题: Method and system for estimating manufacturing target bias
- 专利标题(中): 估算制造目标偏差的方法和系统
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申请号: US10994078申请日: 2004-11-19
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公开(公告)号: US20060111803A1公开(公告)日: 2006-05-25
- 发明人: Yen-Pu Hsu , Cheng Wei , Mei-Jen Wu
- 申请人: Yen-Pu Hsu , Cheng Wei , Mei-Jen Wu
- 主分类号: G06F19/00
- IPC分类号: G06F19/00
摘要:
A computer implemented method for estimating manufacturing target bias for products in manufacturing tools. The method first establishes a first data set according to manufacturing target bias history based on a correlation with tools used. The manufacturing tools comprise a first manufacturing tool and other manufacturing tools. Next, a testing operation is executed for a predicted product in the first manufacturing tool to obtain a first predicted manufacturing target bias. Finally, manufacturing target bias of the predicted product in the other manufacturing tools is calculated according to the first data set and the first predicted manufacturing target bias.
公开/授权文献
- US07127316B2 Method and system for estimating manufacturing target bias 公开/授权日:2006-10-24
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