发明申请
- 专利标题: Projection electron beam lithography apparatus and method employing an estimator
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申请号: US11328876申请日: 2006-01-10
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公开(公告)号: US20060116858A1公开(公告)日: 2006-06-01
- 发明人: Stuart Stanton
- 申请人: Stuart Stanton
- 申请人地址: US PA Allentown 18109 US NJ New Providence 07974
- 专利权人: Agere Systems Inc.,Elith LLC
- 当前专利权人: Agere Systems Inc.,Elith LLC
- 当前专利权人地址: US PA Allentown 18109 US NJ New Providence 07974
- 主分类号: G06F17/50
- IPC分类号: G06F17/50
摘要:
A process and method for projection beam lithography which utilizes an estimator, such as a Kalman filter to control electron beam placement. The Kalman filter receives predictive information from a model and measurement information from a projection electron beam lithography tool and compensates for factors which cause beam placement error such as wafer heating and beam drift. The process and method may also utilize an adaptive Kalman filter to control electron beam placement. The adaptive Kalman filter receives predictive information from a number of models and measurement information from a projection electron beam lithography tool and compensates for factors which cause beam placement error such as heating and beam drift. The Kalman filter may be implemented such that real-time process control may be achieved.