发明申请
- 专利标题： ENDPOINT DETECTION FOR THE PATTERNING OF LAYERED MATERIALS
- 专利标题（中）： 用于分层材料的端点检测
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申请号： US10904883申请日： 2004-12-02
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公开(公告)号： US20060118718A1公开(公告)日： 2006-06-08
- 发明人: Michael Sievers , Siddhartha Panda , Richard Wise
- 申请人： Michael Sievers , Siddhartha Panda , Richard Wise
- 主分类号： G01N23/227
- IPC分类号： G01N23/227
摘要：
Photoelectron emissions are used to detect an endpoint of a thickness alteration of a topmost layer in a set of layers undergoing patterning. The set of layers are irradiated, which causes an emission of photoelectrons. Upon receipt of or absence of a photoelectron emission, patterning endpoint is detected.
公开/授权文献
- US07285775B2 Endpoint detection for the patterning of layered materials 公开/授权日：2007-10-23
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