发明申请
- 专利标题: Calibration substrate and method for calibrating a lithographic apparatus
- 专利标题(中): 校准基板和校准光刻设备的方法
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申请号: US11006819申请日: 2004-12-08
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公开(公告)号: US20060119830A1公开(公告)日: 2006-06-08
- 发明人: Joost Ottens , Jeroen Johannes Maria Mertens , Frederick De Jong , Koen Goorman , Boris Menchtchikov
- 申请人: Joost Ottens , Jeroen Johannes Maria Mertens , Frederick De Jong , Koen Goorman , Boris Menchtchikov
- 申请人地址: NL Veldhoven
- 专利权人: ASML NETHERLANDS B.V.
- 当前专利权人: ASML NETHERLANDS B.V.
- 当前专利权人地址: NL Veldhoven
- 主分类号: G03B27/32
- IPC分类号: G03B27/32
摘要:
A calibration substrate for use during calibration of a lithographic apparatus is disclosed. The calibration substrate includes a first substantially flat surface, a second substantially flat surface that is substantially parallel to the first surface, and an edge that connects the first surface to the second surface. The calibration substrate has a thermal expansion coefficient of less than about 1.0×10−6 K−1 to reduce deformation thereof due to thermal changes in the substrate while in the lithographic apparatus.
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