发明申请
- 专利标题: Charged particle beam apparatus and contamination removal method therefor
- 专利标题(中): 带电粒子束装置及其污染除去方法
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申请号: US11293148申请日: 2005-12-05
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公开(公告)号: US20060138363A1公开(公告)日: 2006-06-29
- 发明人: Akira Yonezawa , Tatenori Jinriki , Jun Nitta , Norimichi Anazawa , Ryuichi Shimizu
- 申请人: Akira Yonezawa , Tatenori Jinriki , Jun Nitta , Norimichi Anazawa , Ryuichi Shimizu
- 申请人地址: JP Tokyo
- 专利权人: HOLON CO., LTD.
- 当前专利权人: HOLON CO., LTD.
- 当前专利权人地址: JP Tokyo
- 优先权: JP2004-358331 20041210
- 主分类号: G01J3/10
- IPC分类号: G01J3/10
摘要:
A charged particle beam apparatus comprising a preparatory evacuation chamber (15 in FIG. 1A) into which a sample (12) is conveyed and which is preliminarily evacuated, an ultraviolet irradiation unit (21) which is disposed in the preparatory evacuation chamber (15) and which irradiates the surface of the sample (12) conveyed into the preparatory evacuation chamber (15), with ultraviolet rays for a predetermined time period, and a sample chamber (16) into which the sample (12) is conveyed in the preliminarily evacuated state of the preparatory evacuation chamber (15) or from which the sample (12) is conveyed into the preparatory evacuation chamber (15), wherein the ultraviolet irradiation of the sample (12) by the ultraviolet irradiation unit (21) is performed before the conveyance of the sample (12) into the sample chamber (16), or/and after the conveyance thereof from the sample chamber (16), thereby to remove contamination on the surface of the sample (12).
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