发明申请
US20060141403A1 Blocked aliphatic thiol stabilizers for photothermographic materials
失效
用于光热敏成像材料的封闭的脂族硫醇稳定剂
- 专利标题： Blocked aliphatic thiol stabilizers for photothermographic materials
- 专利标题（中）： 用于光热敏成像材料的封闭的脂族硫醇稳定剂
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申请号： US11025633申请日： 2004-12-29
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公开(公告)号： US20060141403A1公开(公告)日： 2006-06-29
- 发明人: William Ramsden , James Philip , Doreen Lynch , Kui Chen-Ho , Stacy Ulrich , Kumars Sakizadeh
- 申请人： William Ramsden , James Philip , Doreen Lynch , Kui Chen-Ho , Stacy Ulrich , Kumars Sakizadeh
- 专利权人： Eastman Kodak Company
- 当前专利权人： Eastman Kodak Company
- 主分类号： G03C1/00
- IPC分类号： G03C1/00
摘要：
Photothermographic materials contain one or more blocked aliphatic thiol compounds in an amount of at least 1 mg/m2 as stabilizers. These compounds have a calculated octanol-water partition coefficient (c log P value) of 2.0 or greater, and an N value equal to or greater than 6.5.
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