发明申请
- 专利标题: Material for shadow mask, process for producing the same, shadow mask from the shadow mask material and picture tube including the shadow mask
- 专利标题(中): 用于荫罩的材料,其制造方法,荫罩材料的荫罩和包括荫罩的显像管
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申请号: US10539608申请日: 2003-08-18
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公开(公告)号: US20060145587A1公开(公告)日: 2006-07-06
- 发明人: Toshiyuki Ueda , Shinichi Aoki
- 申请人: Toshiyuki Ueda , Shinichi Aoki
- 申请人地址: JP Chiyoda-ku 102-8447
- 专利权人: Toyo Kohan Co. Ltd.
- 当前专利权人: Toyo Kohan Co. Ltd.
- 当前专利权人地址: JP Chiyoda-ku 102-8447
- 国际申请: PCT/JP03/10403 WO 20030818
- 主分类号: H01J29/81
- IPC分类号: H01J29/81 ; H01J29/80
摘要:
A material for shadow mask excelling in tensile strength and magnetic properties; a process for producing the same; a shadow mask from the shadow mask material; and a picture tube including the shadow mask. A billet comprising C: ≦0.004 wt. %, Si: ≦0.03 wt. %, Mn: 0.1 to 0.5 wt. %, P: ≦0.02 wt. %, S: ≦0.02 wt. %, Al: 0.01 to 0.07 wt. %, N: ≦0.0040 wt. %, B: ≦0.01 wt. %, Nb: ≦0.1 wt % and Ti: 0.0001 to 0.1 wt. % with the remainder composed of Fe and unavoidable impurities is subjected to hot rolling, pickling and cold rolling, further to continuous annealing or box annealing so as to regulate the content of residual C to 0.003 wt. % or less, and still further to secondary cold rolling at a rolling rate of 20 to 92%. Thus, a material for shadow mask is obtained.
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