Invention Application
- Patent Title: Process monitoring for ferroelectric memory devices with in-line retention test
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Application No.: US11027221Application Date: 2004-12-30
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Publication No.: US20060146588A1Publication Date: 2006-07-06
- Inventor: John Rodriguez , Richard Bailey
- Applicant: John Rodriguez , Richard Bailey
- Assignee: Texas Instruments Incorporated
- Current Assignee: Texas Instruments Incorporated
- Main IPC: G11C11/22
- IPC: G11C11/22

Abstract:
The present invention facilitates evaluation of ferroelectric memory devices. A ferroelectric memory device is fabricated that comprises memory cells comprising ferroelectric capacitors (802). A short delay polarization value is obtained (804) by writing a data value, performing a short delay, and reading the data value. A long delay polarization value is obtained (806) by again writing the data value, performing a long delay, and again reading the data value. The short delay and long delay polarization values are compared (808) to obtain a data retention lifetime for the ferroelectric memory device. The obtained data retention lifetime is compared with acceptable values (810) and, if deemed unacceptable, avoids unnecessary performance of thermal bake data retention lifetime testing.
Public/Granted literature
- US07149137B2 Process monitoring for ferroelectric memory devices with in-line retention test Public/Granted day:2006-12-12
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