Invention Application
- Patent Title: Method and apparatus for manufacturing gallium nitride based single crystal substrate
- Patent Title (中): 用于制造氮化镓基单晶衬底的方法和装置
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Application No.: US11220020Application Date: 2005-09-06
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Publication No.: US20060148186A1Publication Date: 2006-07-06
- Inventor: Soo Min Lee , Masayoshi Koike , Kyeong Ik Min , Cheol Kyu Kim , Sung Hwan Jang , Min Ho Kim
- Applicant: Soo Min Lee , Masayoshi Koike , Kyeong Ik Min , Cheol Kyu Kim , Sung Hwan Jang , Min Ho Kim
- Applicant Address: KR Suwon
- Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee Address: KR Suwon
- Priority: KR10-2005-0000265 20050103
- Main IPC: H01L21/336
- IPC: H01L21/336

Abstract:
A method and apparatus for manufacturing a nitride based single crystal substrate. The method includes placing a preliminary substrate on a susceptor installed in a reaction chamber; growing a nitride single crystal layer on the preliminary substrate; and irradiating a laser beam to separate the nitride single crystal layer from the preliminary substrate under the condition that the preliminary substrate is placed in the reaction chamber.
Information query
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