发明申请
- 专利标题： Method of producing polishing pad
- 专利标题（中）： 抛光垫的生产方法
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申请号： US11366238申请日： 2006-03-02
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公开(公告)号： US20060148392A1公开(公告)日： 2006-07-06
- 发明人: Koichi Ono , Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Shigeru Komai , Masayuki Tsutsumi
- 申请人： Koichi Ono , Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Shigeru Komai , Masayuki Tsutsumi
- 优先权： JP2000-367468 20001201; JP2000-367469 20001201; JP2001-13405 20010122; JP2001-61221 20010306; JP2001-103699 20010402; JP2001-225568 20010726; JP2001-234577 20010802; JP2001-269928 20010906; JP2001-274011 20010910; JP2001-302939 20010928; JP2001-302940 20010928; JP2001-302941 20010928
- 主分类号： B24D11/00
- IPC分类号： B24D11/00
摘要：
A method of producing a polishing pad having a polishing layer is characterized in that the polishing layer is produced by a photolithographic method including: forming a sheet molding from a curing composition containing at least an initiator and an energy ray-reactive compound to be cured with energy rays; exposing the sheet molding to energy rays to induce modification thereof, to change the solubility of the sheet molding in a solvent; and developing the sheet molding after irradiation with energy rays, to partially remove the curing composition with a solvent thereby forming a concave and convex pattern at least one surface.
公开/授权文献
- US07329170B2 Method of producing polishing pad 公开/授权日：2008-02-12