发明申请
- 专利标题: Lithographic apparatus, device manufacturing method, and device manufactured thereby
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申请号: US11312654申请日: 2005-12-21
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公开(公告)号: US20060158638A1公开(公告)日: 2006-07-20
- 发明人: Koen Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Hendricus Meijer , Joost Ottens , Marco Kluse , Jan Hopman
- 申请人: Koen Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Hendricus Meijer , Joost Ottens , Marco Kluse , Jan Hopman
- 申请人地址: NL Veldhoven
- 专利权人: ASML NETHERLANDS B.V.
- 当前专利权人: ASML NETHERLANDS B.V.
- 当前专利权人地址: NL Veldhoven
- 优先权: EP03077318.8 20030723
- 主分类号: G03B27/58
- IPC分类号: G03B27/58
摘要:
A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation. The protrusions are generally spaced apart equidistantly at a first distance. The article holder also includes a pair of electrodes for clamping the article to the holder. The electrodes are disposed in substantially the same plane above or below the protrusions, and are spaced apart from one another by a gap. Neighboring protrusions within the plurality of protrusions that are located on opposite sides of the gap are spaced apart by a second distance that is greater than the first distance.