发明申请
US20060159931A1 Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method
有权
掩模空白提供系统，掩模坯提供方法，掩模空白透明基板制造方法，掩模板制造方法和掩模制造方法
- 专利标题： Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method
- 专利标题（中）： 掩模空白提供系统，掩模坯提供方法，掩模空白透明基板制造方法，掩模板制造方法和掩模制造方法
-
申请号： US11225153申请日： 2005-09-14
-
公开(公告)号： US20060159931A1公开(公告)日： 2006-07-20
- 发明人: Osamu Suzuki , Hiroyuki Akagawa , Masaru Tanabe , Atsushi Kawaguchi , Naozumi Ishibashi
- 申请人： Osamu Suzuki , Hiroyuki Akagawa , Masaru Tanabe , Atsushi Kawaguchi , Naozumi Ishibashi
- 专利权人： HOYA CORPORATION
- 当前专利权人： HOYA CORPORATION
- 优先权： JP2004-269569 20040916
- 主分类号： B32B9/00
- IPC分类号： B32B9/00 ; B32B17/06 ; B32B17/10 ; G03F1/00
摘要：
A mask blank manufacturing department manufactures a mask blank by forming a thin film to be a mask pattern on a mask blank transparent substrate. When providing the mask blank to a mask manufacturing department, the mask blank manufacturing department provides optical characteristic information (transmittance variation) of the mask blank transparent substrate and optical characteristic information (transmittance variation and/or phase difference variation) of the mask blank to the mask manufacturing department. The optical characteristic information of the mask blank transparent substrate is provided to the mask blank manufacturing department from a materials processing department that manufactures mask blank transparent substrates.
公开/授权文献
信息查询
