发明申请
- 专利标题: Device and method of forming film
- 专利标题(中): 薄膜成膜装置及方法
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申请号: US11326906申请日: 2006-01-06
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公开(公告)号: US20060160026A1公开(公告)日: 2006-07-20
- 发明人: Shinichi Yotsuya , Shinji Kanemaru
- 申请人: Shinichi Yotsuya , Shinji Kanemaru
- 专利权人: Seiko Epson Corporation
- 当前专利权人: Seiko Epson Corporation
- 优先权: JP2005-012401 20050120
- 主分类号: G03F7/00
- IPC分类号: G03F7/00
摘要:
A film forming device includes a mask member that is made of silicon and has first openings of predetermined patterns; a magnetic member that is made of a magnetic material and has a second opening, and that is aligned with the mask member so that the first openings are arranged in the second opening in plan view of the second opening; and a substrate holding member that generates magnetic force between the magnetic member and itself in order to adhere the mask member and a substrate to each other. The mask member and the substrate are interposed between the magnetic member and the substrate holding member in this order from the magnetic member.
公开/授权文献
- US07976633B2 Device and method of forming film 公开/授权日:2011-07-12
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