Invention Application
- Patent Title: Bandgap cascade cold cathode
- Patent Title (中): 带隙级联冷阴极
-
Application No.: US11345143Application Date: 2006-02-01
-
Publication No.: US20060169969A1Publication Date: 2006-08-03
- Inventor: Chia-Gee Wang , Adam Filios
- Applicant: Chia-Gee Wang , Adam Filios
- Assignee: Nanodynamics 88
- Current Assignee: Nanodynamics 88
- Main IPC: H01L29/06
- IPC: H01L29/06

Abstract:
A bandgap cascade cold cathode is obtained by constructing a wide bandgap Si/C superlattice thin film; depositing Si on the epitaxial silicon surface under CVD or ALD; depositing on the Si/C surface a first metal effective to form a metal-silicide electrode; etching away the silicon substrate to form an effectively smooth Si/C surface thereon; coating the effectively smooth Si/C surface with a thicker second effective metal to form a Schottky electrode surface on which a layer of about 200 nm Pt or Au is coated with edges masked off and welded onto a Cu electrode disc as a heat sink. During avalanche multiplication under reverse bias over the Si/C layer, the bandgap energy cascades from the Schottky electrode to the sink electrode and is used to balance against the work function of the sink electrode, thereby allowing the sink electrode to function as a cold cathode emitter at a reduced applied external field.
Information query
IPC分类: