发明申请
US20060177532A1 Imprint lithography method to control extrusion of a liquid from a desired region on a substrate
审中-公开
压印光刻方法来控制液体从衬底上的期望区域的挤出
- 专利标题： Imprint lithography method to control extrusion of a liquid from a desired region on a substrate
- 专利标题（中）： 压印光刻方法来控制液体从衬底上的期望区域的挤出
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申请号： US11051533申请日： 2005-02-04
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公开(公告)号： US20060177532A1公开(公告)日： 2006-08-10
- 发明人: Edward Fletcher , Ian McMackin , Michael Miller , Nicholas Stacey , Wesley Martin , Frank Xu , Christopher Mackay , Van Truskett
- 申请人： Edward Fletcher , Ian McMackin , Michael Miller , Nicholas Stacey , Wesley Martin , Frank Xu , Christopher Mackay , Van Truskett
- 专利权人： Molecular Imprints, Inc.
- 当前专利权人： Molecular Imprints, Inc.
- 主分类号： B29C67/00
- IPC分类号： B29C67/00
摘要：
The present invention is directed to a method of controlling a quantity of liquid from extruding from a volumetric gap defined between a mold included in the substrate and a region of the substrate in superimposition therewith that features varying the capillary forces between the liquid and one of the template and the substrate. To that end, the method includes generating capillary forces between the liquid and one of the template and the substrate; and varying a magnitude of the forces to create a gradient of forces.
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