发明申请
- 专利标题： Method of producing electronic device
- 专利标题（中）： 电子设备的制造方法
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申请号： US11341664申请日： 2006-01-30
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公开(公告)号： US20060182878A1公开(公告)日： 2006-08-17
- 发明人: Itaru Takaya , Toshihide Kimura
- 申请人： Itaru Takaya , Toshihide Kimura
- 申请人地址： JP TOKYO
- 专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人地址： JP TOKYO
- 优先权： JP2005-035382 20050214
- 主分类号： C23C28/00
- IPC分类号： C23C28/00 ; B05D3/02 ; B05D1/36
摘要：
To provide a method of producing an electronic device which can improve the durability of the device without reducing the initial performance of the device. The method of the present invention is a method of producing an electronic device including: a first organic layer formation step of forming a first organic layer on a first electrode, and a second organic layer formation step of forming a second organic layer on the first organic layer, wherein the method further includes a heating step of heating the first electrode before the first organic layer formation step, and wherein the first organic layer formation step includes a first organic layer vapor-deposition step of forming the first organic layer on the heated first electrode by vapor-deposition and a cooling step of cooling the first organic layer.