发明申请
US20060186352A1 Measuring method, exposure apparatus, and device manufacturing method 失效
测量方法,曝光装置和装置制造方法

  • 专利标题: Measuring method, exposure apparatus, and device manufacturing method
  • 专利标题(中): 测量方法,曝光装置和装置制造方法
  • 申请号: US11359303
    申请日: 2006-02-21
  • 公开(公告)号: US20060186352A1
    公开(公告)日: 2006-08-24
  • 发明人: Mitsuaki Amemiya
  • 申请人: Mitsuaki Amemiya
  • 优先权: JP2005-043477 20050221
  • 主分类号: G21G5/00
  • IPC分类号: G21G5/00
Measuring method, exposure apparatus, and device manufacturing method
摘要:
A measuring method that utilizes a bandpass filter and a measurement apparatus to measure an intensity of light having a predetermined wavelength among lights emitted from a light source, the bandpass filter transmitting the light having the predetermined wavelength, the measurement apparatus measuring an absolute intensity of an incident light includes the steps of measuring an output of the measurement apparatus continuously, stopping or starting an emission of the light source in the measuring step, calculating a first extreme value t→t0−0 and a second extreme value t→t0+0 in the output of the measurement apparatus at time t0 where t is time in the measuring step, and t0 is time when the emission of the light source stops; and calculating a difference between the first extreme value t→t0−0 and the second extreme value t→t0+0.
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