- 专利标题: Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same
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申请号: US11378482申请日: 2006-03-20
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公开(公告)号: US20060199039A1公开(公告)日: 2006-09-07
- 发明人: Jong Park , Eun Jang , Shin Jun , Tae Ahn , Sung Lee
- 申请人: Jong Park , Eun Jang , Shin Jun , Tae Ahn , Sung Lee
- 申请人地址: KR GYEONGGI-DO
- 专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址: KR GYEONGGI-DO
- 优先权: KR2003-73338 20031021
- 主分类号: B32B19/00
- IPC分类号: B32B19/00
摘要:
Semiconductor nanocrystals surface-coordinated with a compound containing a photosensitive functional group, a photosensitive composition comprising semiconductor nanocrystals, and a method for forming semiconductor nanocrystal pattern by producing a film using the photosensitive semiconductor nanocrystals or the photosensitive composition, exposing the film to light and developing the exposed film, are provided. The semiconductor nanocrystal pattern exhibits luminescence characteristics comparable to the semiconductor nanocrystals before patterning and can be usefully applied to organic-inorganic hybrid electroluminescent devices.
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