发明申请
US20060199310A1 Semiconductor integrated circuit and semiconductor device 审中-公开
半导体集成电路和半导体器件

  • 专利标题: Semiconductor integrated circuit and semiconductor device
  • 专利标题(中): 半导体集成电路和半导体器件
  • 申请号: US11366552
    申请日: 2006-03-03
  • 公开(公告)号: US20060199310A1
    公开(公告)日: 2006-09-07
  • 发明人: Yukio NakabayashiJunji Koga
  • 申请人: Yukio NakabayashiJunji Koga
  • 优先权: JPP2005-60843 20050304
  • 主分类号: H01L21/82
  • IPC分类号: H01L21/82 H01L23/02
Semiconductor integrated circuit and semiconductor device
摘要:
A semiconductor integrated circuit includes a substrate having a main surface to which a first stress is applied; a first channel conductive field effect transistor placed in a first region of the main surface of the substrate, the carrier mobility of a channel of the first channel conductive field effect transistor being improved by the first stress; and a second channel conductive field effect transistor placed in a second region of the main surface of the substrate, and receiving a second stress at a channel thereof, the second stress being opposite to the first stress, the carrier mobility of the channel of the second channel conductive field effect transistor being improved by the second stress, and the second region being independent from the first region.
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