- 专利标题: Ribs for line collapse prevention in damascene structures
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申请号: US11069068申请日: 2005-03-01
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公开(公告)号: US20060199369A1公开(公告)日: 2006-09-07
- 发明人: Sajan Marokkey , O Park , Wai-Kin Li , Todd Bailey
- 申请人: Sajan Marokkey , O Park , Wai-Kin Li , Todd Bailey
- 主分类号: H01L21/4763
- IPC分类号: H01L21/4763
摘要:
A method of preventing resist line collapse in damascene structures and a structure thereof is disclosed. A damascene pattern for resist lines is enhanced with ribs extending therefrom. The ribs provide mechanical support for resist lines and improve the lithography process for forming the resist lines, particularly when a negative focus is used. The ribs may extend between vias in an underlying material layer. The method results in structurally strong resist lines for damascene structures that are less likely to collapse.
公开/授权文献
- US07514356B2 Ribs for line collapse prevention in damascene structures 公开/授权日:2009-04-07