发明申请
- 专利标题: Illumination system particularly for microlithography
- 专利标题(中): 照明系统特别适用于微光刻
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申请号: US11384636申请日: 2006-03-21
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公开(公告)号: US20060208206A1公开(公告)日: 2006-09-21
- 发明人: Joachim Hainz , Wolfgang Singer , Erich Schubert
- 申请人: Joachim Hainz , Wolfgang Singer , Erich Schubert
- 主分类号: G21G4/00
- IPC分类号: G21G4/00
摘要:
An illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength especially ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.
公开/授权文献
- US07405809B2 Illumination system particularly for microlithography 公开/授权日:2008-07-29