发明申请
US20060216616A1 Photomask for measuring lens aberration, method of its manufacture, and method of its use
失效
用于测量透镜像差的光掩模，其制造方法及其使用方法
- 专利标题： Photomask for measuring lens aberration, method of its manufacture, and method of its use
- 专利标题（中）： 用于测量透镜像差的光掩模，其制造方法及其使用方法
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申请号： US11388887申请日： 2006-03-23
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公开(公告)号： US20060216616A1公开(公告)日： 2006-09-28
- 发明人: Jang-Ho Shin , Han-Ku Chu , Sang-Gyun Woo , Suk-Joo Lee
- 申请人： Jang-Ho Shin , Han-Ku Chu , Sang-Gyun Woo , Suk-Joo Lee
- 优先权： KR2005-24074 20050323
- 主分类号： G06F17/50
- IPC分类号： G06F17/50 ; G01B9/00 ; G03F1/00
摘要：
A photomask for measuring lens aberration, a method of manufacturing the photomask, and a method of measuring lens aberration using the photomask are provided. In an embodiment, the photomask includes a transparent substrate having first and second surfaces. A reference pattern group and an encoded pattern group are formed on the second surface of the transparent substrate, spaced apart from each other. An aperture that includes a Fresnel zone is formed to face the second surface on the second surface of the transparent substrate. Light throughput and measurement efficiency are improved.
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