发明申请
US20060216652A1 Composition for forming anti-reflective coating for use in lithography
有权
用于形成用于光刻的抗反射涂层的组合物
- 专利标题: Composition for forming anti-reflective coating for use in lithography
- 专利标题(中): 用于形成用于光刻的抗反射涂层的组合物
-
申请号: US11444392申请日: 2006-06-01
-
公开(公告)号: US20060216652A1公开(公告)日: 2006-09-28
- 发明人: Takahiro Kishioka , Shinya Arase , Ken-ichi Mizusawa
- 申请人: Takahiro Kishioka , Shinya Arase , Ken-ichi Mizusawa
- 申请人地址: JP TOKYO
- 专利权人: NISSAN CHEMICAL INDUSTRIES, LTD.
- 当前专利权人: NISSAN CHEMICAL INDUSTRIES, LTD.
- 当前专利权人地址: JP TOKYO
- 优先权: JP2001-111230 20010410
- 主分类号: G03C5/00
- IPC分类号: G03C5/00
摘要:
A composition for forming anti-reflective coating for use in a lithographic process in manufacture of a semiconductor device, comprising as a component a resin containing cyanuric acid or a derivative thereof, or a resin containing a structural unit derived from cyanuric acid or a derivative thereof. The structural unit is preferably represented by formula (1): and can be contained in a main chain or a side chain, or both main chain and side chain of a resin. The anti-reflective coating for lithography obtained from the composition has a high reflection reducing effect and does not cause intermixing with a resist layer to give an excellent resist pattern. It has a higher selectivity in dry-etching compared with the resists.