发明申请
US20060217574A1 Method for producing 3,3 diallyl-4,4 dihydroxydiphenylsulfone
审中-公开
3,3二烯丙基-4,4二羟基二苯砜的制备方法
- 专利标题: Method for producing 3,3 diallyl-4,4 dihydroxydiphenylsulfone
- 专利标题(中): 3,3二烯丙基-4,4二羟基二苯砜的制备方法
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申请号: US10551481申请日: 2004-03-31
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公开(公告)号: US20060217574A1公开(公告)日: 2006-09-28
- 发明人: Hirotaka Enokida , Masaki Fujimoto , Katsunori Nakamura , Tetsushi Yamamoto , Yuji Wada , Shozo Yanagida
- 申请人: Hirotaka Enokida , Masaki Fujimoto , Katsunori Nakamura , Tetsushi Yamamoto , Yuji Wada , Shozo Yanagida
- 优先权: JP2003-100352 20030403; JP2003-306348 20030829
- 国际申请: PCT/JP04/04719 WO 20040331
- 主分类号: C07C315/04
- IPC分类号: C07C315/04
摘要:
The present invention is characterized by subjecting 4,4′-diallyloxydiphenyl sulfone to a rearrangement reaction under microwave irradiation, preferably in molten state, to produce objective 3,3′-diallyl-4,4′-dihydroxydiphenyl sulfone efficiently in a short time, in high yield and in high purity. Further preferably, by carrying out said reaction in substantially oxygen-free atmosphere in the presence of at least one compound selected from a group consisting of an antioxidant, an organic basic compound and a chelate compound, the above-described object can be attained in more preferable manner.