发明申请
US20060220545A1 PHOTORESIST MASK/SMOOTHING LAYER ENSURING THE FIELD HOMOGENEITY AND BETTER STEP-COVERAGE IN OLED DISPLAYS 失效
在OLED显示屏中保持场均匀性和更好的步进覆盖的光电隔离膜/平滑层

  • 专利标题: PHOTORESIST MASK/SMOOTHING LAYER ENSURING THE FIELD HOMOGENEITY AND BETTER STEP-COVERAGE IN OLED DISPLAYS
  • 专利标题(中): 在OLED显示屏中保持场均匀性和更好的步进覆盖的光电隔离膜/平滑层
  • 申请号: US11424574
    申请日: 2006-06-16
  • 公开(公告)号: US20060220545A1
    公开(公告)日: 2006-10-05
  • 发明人: Ye Tao
  • 申请人: Ye Tao
  • 申请人地址: CA ON Ottawa
  • 专利权人: NATIONAL RESEARCH COUNCIL OF CANADA
  • 当前专利权人: NATIONAL RESEARCH COUNCIL OF CANADA
  • 当前专利权人地址: CA ON Ottawa
  • 主分类号: H01L51/52
  • IPC分类号: H01L51/52 H05B33/02
PHOTORESIST MASK/SMOOTHING LAYER ENSURING THE FIELD HOMOGENEITY AND BETTER STEP-COVERAGE IN OLED DISPLAYS
摘要:
A method of making an organic light emitting device (OLED) is disclosed wherein an inert insulating conformal smoothing layer is deposited over a protruding structure. The smoothing layer is patterned to expose portions of the structure underlying the smoothing layer and defining active regions of the device. The inert smoothing layer is treated, preferably by heat reflow, to taper the layer over the stepped edges of the structure on the exposed portions. Additional layers are then deposited over the smoothing layer and the exposed portions of the structure. The smoothing layer blunts all underlying layer edges and provides sloped edges wherever a step occurs from one layer to another. This effect results in a homogeneous field across the pixel and the continuity in the layers deposited after the photoresist layer.
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