发明申请
- 专利标题: Method of transferring a substrate
- 专利标题(中): 转移基材的方法
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申请号: US11451315申请日: 2006-06-13
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公开(公告)号: US20060225299A1公开(公告)日: 2006-10-12
- 发明人: Hyun-Joo Kim , Yo-Han Ahn , Dong-Seok Ham , Jae-Bong Kim
- 申请人: Hyun-Joo Kim , Yo-Han Ahn , Dong-Seok Ham , Jae-Bong Kim
- 申请人地址: KR Suwon-si
- 专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址: KR Suwon-si
- 优先权: KR2003-8847 20030212
- 主分类号: F26B21/06
- IPC分类号: F26B21/06
摘要:
A method of controlling contamination in a substrate transfer chamber that is disposed between a load port for supporting a container to receive a plurality of substrates and a substrate process module for processing the substrates includes supplying a purge gas into the substrate transfer chamber to purge an interior of the substrate transfer chamber, circulating the purge gas supplied into the substrate transfer chamber through a gas circular pipe, removing particles and airborne molecular contaminants from the purge gas being circulated, and resupplying the circulated purge gas into the substrate transfer chamber.
信息查询
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