发明申请
- 专利标题： Isothermal control of a process chamber
- 专利标题（中）： 处理室的等温控制
-
申请号： US11094876申请日： 2005-03-30
-
公开(公告)号： US20060225769A1公开(公告)日： 2006-10-12
- 发明人: Gentaro Goshi , William Jones
- 申请人： Gentaro Goshi , William Jones
- 主分类号： B08B3/02
- IPC分类号： B08B3/02
摘要：
An apparatus for use in providing a fluid at a predetermined temperature is disclosed. The apparatus comprises: means for supplying a first quantity of a fluid at a first temperature; means for supplying a second quantity of a fluid at a second temperature; and flow-control means for controlling a ratio of the first quantity of the fluid to the second quantity of the fluid for forming a mixed fluid, wherein the ratio is determined in response to a measured temperature of the mixed fluid.
信息查询
IPC分类:
