发明申请
- 专利标题： Controlled pressure differential in a high-pressure processing chamber
- 专利标题（中）： 高压处理室中的受控压差
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申请号： US11093944申请日： 2005-03-29
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公开(公告)号： US20060225772A1公开(公告)日： 2006-10-12
- 发明人: William Jones
- 申请人： William Jones
- 主分类号： B08B3/00
- IPC分类号： B08B3/00 ; H01L21/306
摘要：
A method and apparatus for controlling a pressure differential in a high pressure processing chamber are disclosed. The pressure differential is related to a difference between a pressure generated within the high pressure processing chamber and a sealing force for maintaining the high-pressure processing chamber. By maintaining the pressure differential within a predefined range, contaminants produced when forming and maintaining the processing chamber are reduced or eliminated.
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