发明申请
- 专利标题: Collector mirror for plasma-based, short-wavelength radiation sources
- 专利标题(中): 用于等离子体,短波长辐射源的集光镜
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申请号: US11402391申请日: 2006-04-11
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公开(公告)号: US20060227826A1公开(公告)日: 2006-10-12
- 发明人: Istvan Balogh , Kai Gaebel
- 申请人: Istvan Balogh , Kai Gaebel
- 专利权人: XTREME technologies GmbH
- 当前专利权人: XTREME technologies GmbH
- 优先权: DE102005017262.8 20050412
- 主分类号: H01S3/04
- IPC分类号: H01S3/04
摘要:
The invention is directed to a collector mirror for short-wavelength radiation based on a plasma. It is the object of the invention to find a novel possibility for managing the temperature of a collector mirror for focusing short-wavelength radiation generated from a plasma which allows an efficient thermal connection to be produced between the optically active mirror surface and a thermostat system without the disadvantages relating to space requirements or high-precision manufacture of the collector mirror. This object is met, according to the invention, in that the collector mirror has a solid, rotationally symmetric substrate which comprises a material with high thermal conductivity of more than 50 W/mK and in which channels for cooling and temperature management are incorporated in the substrate so that a heat transport medium can flow through directly and for rapidly stabilizing the temperature of the optically active mirror surface. Heat of transient temperature spikes which occur in pulsed operation for plasma generation at the mirror surface and which temporarily exceed the temperature average by a multiple is quickly dissipated.
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