- 专利标题: METHOD AND DEVICE FOR CHECKING LITHOGRAPHY DATA
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申请号: US11423082申请日: 2006-06-08
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公开(公告)号: US20060234140A1公开(公告)日: 2006-10-19
- 发明人: Husayn Alvarez-Gomariz , John Futrell
- 申请人: Husayn Alvarez-Gomariz , John Futrell
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 主分类号: G06F17/50
- IPC分类号: G06F17/50 ; G03F1/00 ; G21K5/00 ; G06K9/00
摘要:
Devices and methods are provided that include advantages such as the ability to identify sizes, shapes and locations of frequently unwanted additional features that occur as a result of photolithographic interference. The additional feature information is obtained through use of simulation methods with reduced processing time or solving a system of equations. This allows a user to quickly find information about additional feature printing before the features are printed, and before the reticle is made.
公开/授权文献
- US07549143B2 Method and device for checking lithography data 公开/授权日:2009-06-16