- 专利标题: Recessed-type field effect transistor with reduced body effect
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申请号: US11452867申请日: 2006-06-14
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公开(公告)号: US20060234437A1公开(公告)日: 2006-10-19
- 发明人: Dong-Hyun Kim , Du-Heon Song , Sang-Hyun Lee , Hyeoung-Won Seo , Dae-Joong Won
- 申请人: Dong-Hyun Kim , Du-Heon Song , Sang-Hyun Lee , Hyeoung-Won Seo , Dae-Joong Won
- 优先权: KR2004-0009122 20040211
- 主分类号: H01L21/8238
- IPC分类号: H01L21/8238
摘要:
For fabricating a field effect transistor, an extra-doped channel region is formed below a surface of a semiconductor substrate. An opening is formed in the semiconductor substrate into the extra-doped channel region. A gate insulator is formed at walls of the opening such that the extra-doped channel region abuts the gate insulator at a bottom portion of the opening. The opening is filled with a gate electrode. Such an extra-doped channel region prevents undesired body effect in the field effect transistor.
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