发明申请
- 专利标题： Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
- 专利标题（中）： 曝光装置，光学投影装置和调整光学投影装置的方法
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申请号： US11471658申请日： 2006-06-21
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公开(公告)号： US20060238729A1公开(公告)日： 2006-10-26
- 发明人: Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
- 申请人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
- 申请人地址： JP TOKYO
- 专利权人： NIKON CORPORATION
- 当前专利权人： NIKON CORPORATION
- 当前专利权人地址： JP TOKYO
- 优先权： JP161588/1993 19930630; JP345619/1993 19931222; JP116800/1994 19940530; JP123762/1994 19940606; JP141326/1994 19940623; JP177898/1994 19940729; JP200494/1994 19940825
- 主分类号： G03B27/42
- IPC分类号： G03B27/42
摘要：
An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.
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