发明申请
US20060238953A1 Electrostatic chuck with smart lift-pin mechanism for a plasma reactor 有权
用于等离子体反应器的具有智能举升机构的静电卡盘

Electrostatic chuck with smart lift-pin mechanism for a plasma reactor
摘要:
A lift pin assembly for use in a reactor for processing a workpiece includes plural lift pins extending generally parallel with a lift direction, each of the plural lift pins having a top end for supporting a workpiece and a bottom end. A lift table faces the bottom ends of the pins and is translatable in a direction generally parallel with the lift direction. A small force detector senses a force exerted by the lift pins that is sufficiently large to indicate a chucked wafer and sufficiently small to avoid dechucking a wafer A large force detector senses a force exerted by the lift pins in a range sufficient to de-chuck the wafer.
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