发明申请
US20060238953A1 Electrostatic chuck with smart lift-pin mechanism for a plasma reactor
有权
用于等离子体反应器的具有智能举升机构的静电卡盘
- 专利标题: Electrostatic chuck with smart lift-pin mechanism for a plasma reactor
- 专利标题(中): 用于等离子体反应器的具有智能举升机构的静电卡盘
-
申请号: US11115951申请日: 2005-04-26
-
公开(公告)号: US20060238953A1公开(公告)日: 2006-10-26
- 发明人: Hiroji Hanawa , Andrew Nguyen , Kenneth Collins , Kartik Ramaswamy , Biagio Gallo , Amir Al-Bayati
- 申请人: Hiroji Hanawa , Andrew Nguyen , Kenneth Collins , Kartik Ramaswamy , Biagio Gallo , Amir Al-Bayati
- 主分类号: H01T23/00
- IPC分类号: H01T23/00
摘要:
A lift pin assembly for use in a reactor for processing a workpiece includes plural lift pins extending generally parallel with a lift direction, each of the plural lift pins having a top end for supporting a workpiece and a bottom end. A lift table faces the bottom ends of the pins and is translatable in a direction generally parallel with the lift direction. A small force detector senses a force exerted by the lift pins that is sufficiently large to indicate a chucked wafer and sufficiently small to avoid dechucking a wafer A large force detector senses a force exerted by the lift pins in a range sufficient to de-chuck the wafer.