发明申请
- 专利标题： SUBSTRATE SUPPORT LIFT MECHANISM
- 专利标题（中）： 基台支持机构
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申请号： US11426555申请日： 2006-06-26
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公开(公告)号： US20060240542A1公开(公告)日： 2006-10-26
- 发明人: Eric Schieve , Keith Koai , David Or , Rene Correa
- 申请人： Eric Schieve , Keith Koai , David Or , Rene Correa
- 主分类号： C12M1/34
- IPC分类号： C12M1/34
摘要：
An apparatus for positioning a substrate support within a processing chamber is provided. In one embodiment, an apparatus for positioning a substrate support includes a yoke comprising a curved surface with a first slot formed therethrough, a base comprising a first surface adapted to support the substrate support and a curved second surface, wherein the curved second surface mates with the curved surface of the yoke and a first slot is formed through the curved second surface of the base, and a first threaded member disposed through the first slot in the yoke and the first slot in the base.
公开/授权文献
- US07871470B2 Substrate support lift mechanism 公开/授权日：2011-01-18