- 专利标题： In-line electron beam test system
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申请号： US11375625申请日： 2006-03-14
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公开(公告)号： US20060244467A1公开(公告)日： 2006-11-02
- 发明人: Fayez Abboud , Sriram Krishnaswami , Benjamin Johnston , Hung Nguyen , Matthias Brunner , Ralf Schmid , John White , Shinichi Kurita , James Hunter
- 申请人： Fayez Abboud , Sriram Krishnaswami , Benjamin Johnston , Hung Nguyen , Matthias Brunner , Ralf Schmid , John White , Shinichi Kurita , James Hunter
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 主分类号： G01R31/302
- IPC分类号： G01R31/302
摘要：
A method and apparatus for testing a plurality of electronic devices formed on a large area substrate is described. In one embodiment, the apparatus performs a test on the substrate in one linear axis in at least one chamber that is slightly wider than a dimension of the substrate to be tested. Clean room space and process time is minimized due to the smaller dimensions and volume of the system.
公开/授权文献
- US07535238B2 In-line electron beam test system 公开/授权日：2009-05-19
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