发明申请
US20060246361A1 Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask
有权
掩模坯料玻璃基板的制造方法，掩模坯料的制造方法，掩模制造方法，掩模坯料玻璃基板，掩模坯料和掩模
- 专利标题： Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask
- 专利标题（中）： 掩模坯料玻璃基板的制造方法，掩模坯料的制造方法，掩模制造方法，掩模坯料玻璃基板，掩模坯料和掩模
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申请号： US11391332申请日： 2006-03-29
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公开(公告)号： US20060246361A1公开(公告)日： 2006-11-02
- 发明人: Akinori Kurikawa , Hisashi Kasahara , Yasushi Okubo
- 申请人： Akinori Kurikawa , Hisashi Kasahara , Yasushi Okubo
- 专利权人： HOYA CORPORATION
- 当前专利权人： HOYA CORPORATION
- 优先权： JP2005-96976 20050330; JP2005-377140 20051228
- 主分类号： B32B9/00
- IPC分类号： B32B9/00 ; B32B17/10 ; B32B17/06 ; G03C5/00 ; G03F1/00
摘要：
A method of manufacturing a mask blank glass substrate includes a marking step of irradiating laser light onto a mirror-like surface in an area, having no influence on transfer, on a surface of the mask blank glass substrate to thereby form a pit that is used as a marker for identifying or managing the mask blank glass substrate.
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