Invention Application
- Patent Title: Method and apparatus for process monitoring and control
- Patent Title (中): 过程监控和控制的方法和装置
-
Application No.: US10501558Application Date: 2003-01-28
-
Publication No.: US20060255260A1Publication Date: 2006-11-16
- Inventor: Audunn Ludviksson
- Applicant: Audunn Ludviksson
- International Application: PCT/US03/00047 WO 20030128
- Main IPC: H01J49/00
- IPC: H01J49/00

Abstract:
A method and apparatus for real-time monitoring of a gaseous environment during a semiconductor process. The method utilizes metastable electronic energy transfer to excite and ionize the chamber gaseous effluent and correlates the fluorescence signals from the excited species and mass spectroscopy analysis of the ions generated with the process status. In addition to the ability to produce excited species that fluoresce, the method has the ability to generate molecular ions from labile compounds, reduce fragmentation and operate at higher pressures than conventional ionization methods.
Public/Granted literature
- US07355171B2 Method and apparatus for process monitoring and control Public/Granted day:2008-04-08
Information query