- 专利标题: Charged particle beam device
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申请号: US11341663申请日: 2006-01-30
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公开(公告)号: US20060255269A1公开(公告)日: 2006-11-16
- 发明人: Takeshi Kawasaki , Tomonori Nakano , Michio Hatano , Momoyo Enyama
- 申请人: Takeshi Kawasaki , Tomonori Nakano , Michio Hatano , Momoyo Enyama
- 优先权: JP2005-140588 20050513
- 主分类号: G21K7/00
- IPC分类号: G21K7/00
摘要:
A scanning charged particle microscope which facilitates adjustment, has a deep focal depth, and is provided with an aberration correction means. The state of aberration correction is judged from a SEM image by using a stop having plural openings and the judgment result is fed back to the adjustment of the aberration correction means. A stop of a nearly orbicular zone shape is used in combination with the aberration correction means.
公开/授权文献
- US07504624B2 Charged particle beam device 公开/授权日:2009-03-17
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