发明申请
- 专利标题： Composition for forming silicon-aluminum film, silicon-aluminum film and method for forming the same
- 专利标题（中）： 用于形成硅铝膜的组合物，硅铝膜及其形成方法
-
申请号： US10542358申请日： 2003-12-24
-
公开(公告)号： US20060257667A1公开(公告)日： 2006-11-16
- 发明人: Yasuaki Yokoyama , Michiko Yokoyama , Naomi Shinoda , Risa Yokoyama , Yasuo Matsuki
- 申请人： Yasuaki Yokoyama , Michiko Yokoyama , Naomi Shinoda , Risa Yokoyama , Yasuo Matsuki
- 申请人地址： JP Chuo-ku, Tokyo 104-0045
- 专利权人： JSR CORPORATION
- 当前专利权人： JSR CORPORATION
- 当前专利权人地址： JP Chuo-ku, Tokyo 104-0045
- 优先权： JP2003-8933 20030117
- 国际申请： PCT/JP03/16579 WO 20031224
- 主分类号： C22C21/02
- IPC分类号： C22C21/02 ; B32B9/00
摘要：
A composition for forming a silicon.aluminum film, containing a silicon compound and an aluminum compound. The silicon.aluminum film is obtained by forming a coating film of the above composition and treating it with heat and/or light. The silicon.aluminum film can easily be formed from the above composition by the above method at a low cost without requiring an expensive vacuum apparatus or high-frequency wave generator.
信息查询
