发明申请
US20060258163A1 Methods of fabricating nano-scale and micro-scale mold for nano-imprint, and mold usage on nano-imprinting equipment
审中-公开
制造纳米压印纳米尺度和微尺度模具的方法以及纳米压印设备上的模具使用
- 专利标题： Methods of fabricating nano-scale and micro-scale mold for nano-imprint, and mold usage on nano-imprinting equipment
- 专利标题（中）： 制造纳米压印纳米尺度和微尺度模具的方法以及纳米压印设备上的模具使用
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申请号： US11354029申请日： 2006-02-15
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公开(公告)号： US20060258163A1公开(公告)日： 2006-11-16
- 发明人: Kenya Ohashi , Akihiro Miyauchi , Masahiko Ogino
- 申请人： Kenya Ohashi , Akihiro Miyauchi , Masahiko Ogino
- 优先权： JP2005-109943 20050406
- 主分类号： H01L21/302
- IPC分类号： H01L21/302
摘要：
To provide a metal mold excellent in the mold-release characteristic and the transfer accuracy in a nano-imprint method. By controlling the thickness of a metal oxide film formed in the face of a release agent and a mold, the adhesive amount of the release agent layer formed in the outer layer thereof is adjusted, thereby forming a mold excellent in the mold-release characteristic. The present invention also relates to methods of fabricating molds for nano-imprint, and mold usage on nano-imprinting equipment.
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