Invention Application
- Patent Title: Active mask lithography
- Patent Title (中): 主动掩模光刻
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Application No.: US11413958Application Date: 2006-04-27
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Publication No.: US20060264016A1Publication Date: 2006-11-23
- Inventor: Roderick Hyde , Nathan Myhrvold
- Applicant: Roderick Hyde , Nathan Myhrvold
- Assignee: Searete LLC, a limited liability corporation of the State of Delaware
- Current Assignee: Searete LLC, a limited liability corporation of the State of Delaware
- Main IPC: G03F1/00
- IPC: G03F1/00 ; H01L21/22
Abstract:
An active mask emits a patterned energy flux in response to an energy input.
Public/Granted literature
- US07435514B2 Active mask lithography Public/Granted day:2008-10-14
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